Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
Publications
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48 results for Carl E. Larson
New materials for laser repair of active matrix liquid crystal displays
- P.B. Comita
- Carl E. Larson
- 1994
- MRS Spring Meeting 1994
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
Investigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
The effect of photoresist/topcoat properties on defect formation in immersion lithography
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2007
- Proceedings of SPIE 2007
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Combinatorial resist processing studies
- Carl E. Larson
- Gregory M. Wallraff
- 2004
- Microlithography 2004