Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
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48 results for Carl E. Larson
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Applied Physics Letters
Excited-state chromium atom distributions produced in the KrF* laser multiphoton dissociation of a series of chromium compounds
- George W. Tyndall
- Carl E. Larson
- et al.
- 2002
- Journal of Physical Chemistry
A Novel Copper Complex and CVD Precursor: (η2-2-Butyne)copper(I) Hexafluoroacetylacetonate
- Thomas H. Baum
- Carl E. Larson
- 2002
- Chemistry of Materials
Mechanistic studies of the acidolysis reactions occurring in silicon-containing bilayer photoresists
- Ilya Zharov
- Josef Michl
- et al.
- 2002
- Chemistry of Materials
Characterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering