Focused ion beam metrology
- A. Wagner
- P.G. Blauner
- et al.
- 1995
- MRS Fall Meeting 1995
Publications
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29 results for Alfred Wagner
High conductivity FIB deposited metal
- P.G. Blauner
- A. Wagner
- 1995
- MRS Fall Meeting 1995
Electrodeposited gold;real times stress and structural chance at room temperature
- R.E. Acosta
- I. Babich
- et al.
- 1993
- MRS Spring Meeting 1993
Future beam-controlled processing technologies for microelectronics
- Dieter P. Kern
- Thomas F. Kuech
- et al.
- 1988
- Science
Learning from native defects on EUV mask blanks
- Emily Gallagher
- Alfred Wagner
- et al.
- 2014
- SPIE Optics + Photonics 2014
Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Evaluation of easily removable pellicle adhesive
- Nancy Zhou
- Monica Barrett
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009