Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
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101 results for Gregory M. Wallraff
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Base-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Synthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures
- G.M. Wallraff
- J.L. Hedrick
- et al.
- 1991
- ACS Spring 1991
Large-area spatially ordered arrays of gold nanoparticles directed by lithographically confined DNA origami
- Albert M. Hung
- Christine M. Micheel
- et al.
- 2009
- Nature Nanotechnology
Placement and orientation of individual DNA shapes on lithographically patterned surfaces
- Ryan J. Kershner
- Luisa D. Bozano
- et al.
- 2009
- Nature Nanotechnology
Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists
- Glenn Mcgall
- Jeff Labadie
- et al.
- 1996
- PNAS
Solution Photochemistry of Poly(di-n-alkylsilane)s. An EPR-ENDOR Study of the Structure of the Persistent Radicals
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 1991
- JACS