An analysis of EUV resist stochastic printing failures
- Martha I. Sanchez
- Gregory M. Wallraff
- et al.
- 2019
- EUVL 2019
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101 results for Gregory M. Wallraff
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
A method to characterize pattern density effects: Chemical flare and develop loading
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
The effect of photoresist/topcoat properties on defect formation in immersion lithography
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2007
- Proceedings of SPIE 2007
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005