Overlay Performance in Permanent Bonded Wafer Integration Schemes
- Nathan Ip
- Michael Belyansky
- et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023
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28 results for R. Johnson
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
- Romain Lallement
- Daniel Schmidt
- et al.
- 2023
- OEN 2023
Deep learning acceleration in 14nm CMOS compatible ReRAM array: device, material and algorithm co-optimization
- N. Gong
- Malte J. Rasch
- et al.
- 2022
- IEDM 2022
First Experimental Demonstration of MRAM Data Scrubbing: 80 Mb MRAM with 40 nm junctions for Last Level Cache Applications
- H. Wu
- V. Katragadda
- et al.
- 2021
- IEDM 2021
A 14 nm embedded STT-MRAM CMOS technology
- Daniel C. Edelstein
- M. Rizzolo
- et al.
- 2020
- IEDM 2020
Process Co-Optimization of CVD and CMP for Tungsten Metallization
- Shanti Pancharatnam
- Wei Tsu Tseng
- et al.
- 2020
- ECS J. Solid State Sci. Technol.
LCDU improvement of EUV-patterned vias with DSA
- Jing Guo
- Dustin W. Janes
- et al.
- 2019
- MEMS/NEMS/MOEMS 2019
Track based techniques to improve high-resolution EUV patterning defectivity
- Naoki Shibata
- Lior Huli
- et al.
- 2018
- EUVL 2018
Characterization and control of EUV scanner dose uniformity and stability
- Chris Robinson
- Daniel Corliss
- et al.
- 2018
- SPIE Advanced Lithography 2018
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- Koichi Hontake
- Lior Huli
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017