Multiphonon-electron coupling enhanced defect generation and breakdown mechanism in MOL new spacer dielectrics for 7nm/5nm technology nodes and beyond
- Ernest Wu
- Richard G. Southwick
- et al.
- 2020
- IEDM 2020
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22 results for S. Mehta
A 14 nm embedded STT-MRAM CMOS technology
- Daniel C. Edelstein
- M. Rizzolo
- et al.
- 2020
- IEDM 2020
Improved Air Spacer for Highly Scaled CMOS Technology
- Kangguo Cheng
- Chanro Park
- et al.
- 2020
- IEEE Transactions on Electron Devices
A Systematic Study on BEOL Defectivity Control for Future AI Application
- James H.-C. Chen
- Fee Li Lie
- et al.
- 2020
- ASMC 2020
Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology
- Kangguo Cheng
- Chanro Park
- et al.
- 2020
- VLSI Technology 2020
UV Assisted Densification of PerHydroPoIySilazane (PHPS) based Spin-On glass in High Aspect Ratio Gap Fill Structure
- S. Mehta
- H. Sheng
- et al.
- 2018
- ECS Meeting 2018
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- Ruilong Xie
- Pietro Montanini
- et al.
- 2016
- IEDM 2016
Air spacer for 10nm FinFET CMOS and beyond
- K. Cheng
- C. Park
- et al.
- 2016
- IEDM 2016
A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
- Tenko Yamashita
- S. Mehta
- et al.
- 2015
- VLSI Technology 2015
Strain engineered extremely thin SOI (ETSOI) for high-performance CMOS
- A. Khakifirooz
- Kangguo Cheng
- et al.
- 2012
- VLSI Technology 2012