Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
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18 results for Blake Davis
Novel polyamide bilayer membranes with improved desalination performance
- Young-Hye Na
- Jacquana Diep
- et al.
- 2012
- NSTI-Nanotech 2012
Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Patternable low-κ material for "greener" semiconductor manufacturing
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- ICSICT 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures