Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
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18 results for Blake Davis
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Enhanced desalination performance of polyamide bi-layer membranes prepared by sequential interfacial polymerization
- Young-Hye La
- Jacquana Diep
- et al.
- 2013
- Journal of Membrane Science
High-throughput directed self-assembly of core-shell ferrimagnetic nanoparticle arrays
- Qiu Dai
- Jane Frommer
- et al.
- 2013
- Langmuir
Topographically directed self-assembly of goldnanoparticles
- Qiu Dai
- Charles T. Rettner
- et al.
- 2011
- Journal of Materials Chemistry
Facile chemical rearrangement for photopatterning of POSS derivatives
- Jitendra Rathore
- Qiu Dai
- et al.
- 2011
- Journal of Materials Chemistry
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Characterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering