The Schottky emission effect: A critical examination of a century-old model
- Ernest Y. Wu
- Baozhen Li
- 2022
- Journal of Applied Physics
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Quantum Mechanical Connection of Schottky Emission Process and Its implications on Breakdown Methodology and Conduction Modeling for BEOL Low-k Dielectrics
- Ernest Wu
- Baozhen Li
- 2022
- IRPS 2022
A Flexible and Inherently Self-Consistent Methodology for MOL/BEOL/MIMCAP TDDB Applications with Excessive Variability-Induced Degradation
- Ernest Wu
- Ron Bolam
- et al.
- 2022
- IRPS 2022
Multiphonon-electron coupling enhanced defect generation and breakdown mechanism in MOL new spacer dielectrics for 7nm/5nm technology nodes and beyond
- Ernest Wu
- Richard G. Southwick
- et al.
- 2020
- IEDM 2020
Fundamental roles of extreme-value distributions in dielectric breakdown and memory applications (minimum-value versus maximum-value statistics)
- Ernest Wu
- Takashi Ando
- et al.
- 2020
- Japanese Journal of Applied Physics
Comprehensive Methodology for Multiple Spots Competing Progressive Breakdown for BEOL/FEOL Applications
- Ernest Wu
- Baozhen Li
- et al.
- 2019
- IRPS 2019
Electromigration characteristics of power grid like structures
- Baozhen Li
- Andrew Kim
- et al.
- 2018
- IRPS 2018
Elapsed-time statistics of successive breakdown in the presence of variability for dielectric breakdown in BEOL/MOL/FEOL applications
- Ernest Y. Wu
- Andrew Kim
- et al.
- 2018
- IRPS 2018
Fundamental limitations of existing models and future solutions for dielectric reliability and RRAM applications (invited)
- Ernest Y. Wu
- Andrew Kim
- et al.
- 2017
- IEDM 2017
A new and holistic modelling approach for impact of line-edge roughness on dielectric reliability
- Ernest Y. Wu
- Ramachandran Muralidhar
- et al.
- 2017
- IRPS 2017