A new breed of wet-developable BARC materials
- Libor Vyklicky
- Wu-Song Huang
- et al.
- 2009
- J. Photopolym. Sci. Tech.
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34 results for Wu-Song Huang
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Conducting polymers as lithographic materials
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 2004
- Polymer Engineering & Science
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Nanocomposite resist systems for next generation lithography
- L. Merhari
- K.E. Gonsalves
- et al.
- 2002
- Microelectronic Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering