Development of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013
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26 results for Ranee Kwong
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Patternable low-κ material for "greener" semiconductor manufacturing
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- ICSICT 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Progress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.