Application of "transfer-free" suzuki coupling protocols toward the synthesis of "unambiguously linear" poly(p-phenylenes)
- Felix E. Goodson
- Thomas I. Wallow
- et al.
- 1998
- Macromolecules
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26 results for Tom Wallow
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Mechanistic studies on the aryl-aryl interchange reaction of ArPdL2I (L = triarylphosphine) complexes
- Felix E. Goodson
- Thomas I. Wallow
- et al.
- 1997
- JACS
Synthesis of cycloolefin-maleic anhydride alternating copolymers for 193 nm imaging
- F.M. Houlihan
- Thomas I. Wallow
- et al.
- 1997
- Macromolecules
A commercially viable 193 nm single layer resist platform
- F.M. Houlihan
- Thomas I. Wallow
- et al.
- 1997
- J. Photopolym. Sci. Tech.
The influence of photoacid structure on the design and performance of 193-nm resists
- Robert D. Allen
- Juliann Opitz
- et al.
- 1997
- J. Photopolym. Sci. Tech.