Are extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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26 results for Tom Wallow
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Application of "transfer-free" suzuki coupling protocols toward the synthesis of "unambiguously linear" poly(p-phenylenes)
- Felix E. Goodson
- Thomas I. Wallow
- et al.
- 1998
- Macromolecules
Synthesis of cycloolefin-maleic anhydride alternating copolymers for 193 nm imaging
- F.M. Houlihan
- Thomas I. Wallow
- et al.
- 1997
- Macromolecules