Suppression of boron diffusion in deep submicron devices
- Michael A. Gribelyuk
- Phil Oldiges
- et al.
- 2011
- Journal of Vacuum Science and Technology B
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12 results for Jun Yuan
Gate-induced-drain-leakage current in 45-nm CMOS technology
- Xiaohin Yuan
- Jae-Eun Park
- et al.
- 2008
- IEEE T-DMR