Origin of contaminants in metal films photochemically deposited from the metal hexacarbonyls.
- K.A. Singmaster
- F.A. Houle
- et al.
- 1987
- CLEO 1987
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85 results for Frances A. Houle
Laser - assisted chemical etching
- F.A. Houle
- 1989
- Proceedings of SPIE 1989
Rapid laser-induced chemical etching of semiconductors
- F.A. Houle
- 1989
- Proceedings of SPIE 1989
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Stochastic simulation of heat flow with application to laser-solid interactions
- F.A. Houle
- W.D. Hinsberg
- 1998
- Applied Physics A: Materials Science and Processing
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials
- F.A. Houle
- S. Raoux
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures