Characterization of volatile species formed during exposure of photoresists to ultraviolet light
- F.A. Houle
- V.R. Deline
- et al.
- 2007
- Macromolecules
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85 results for Frances A. Houle
Adhesion between template materials and UV-cured nanoimprint resists
- F.A. Houle
- Eric Guyer
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Antiadhesion considerations for UV nanoimprint lithography
- F.A. Houle
- C.T. Rettner
- et al.
- 2007
- Applied Physics Letters
Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography
- William Hinsberg
- Frances Houle
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Method of measuring the spatial resolution of a photoresist
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 2002
- Optics Letters
Kinetic model for positive tone resist dissolution and roughening
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Macromolecules
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2002
- Journal of Physical Chemistry A