High-K gate stack breakdown statistics modeled by correlated interfacial layer and high-k breakdown path
- G. Ribes
- P. Mora
- et al.
- 2010
- IRPS 2010
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Competitive and cost effective copper/low-k interconnect (BEOL) for 28 nm CMOS technologies
- R. Augur
- C. Child
- et al.
- 2012
- Microelectronic Engineering