Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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104 results for C. Grant Willson
Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates
- Hiroshi Ito
- Brian C. Trinque
- et al.
- 2008
- J Polym Sci Part A
Ferroelectric liquid crystalline polysiloxanes with high spontaneous polarization and possible applications in nonlinear optics
- Heinrich Kapitza
- Rudolf Zentel
- et al.
- 2004
- Advanced Materials
Ramifications of lubrication theory on imprint lithography
- Matthew Colburn
- Byung Jin Choi
- et al.
- 2004
- Microelectronic Engineering
Chemically amplified resists based on polymer side‐chain rearrangement or electrophilic crosslinking
- J.M.J. Fréchet
- S. Matuszczak
- et al.
- 2004
- Polymer Engineering & Science
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
Soluble polysilanes: An interesting new class of radiation sensitive materials
- R.D. Miller
- D. Hofer
- et al.
- 2004
- Polymer Engineering & Science
Chemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science