APPLICATIONS OF PHOTOINITIATORS TO THE DESIGN OF RESISTS FOR SEMICONDUCTOR MANUFACTURING.
- Hiroshi Ito
- Grant Willson
- 1983
- ACS National Meeting 1983
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104 results for C. Grant Willson
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Polysilane Bilayer UV Lithography
- Donald C. Hofer
- Robert D. Miller
- et al.
- 1989
- Proceedings of SPIE 1989
Characterization of the induction effect at mid-ultraviolet exposure: Application to AZ2400 at 313 nm
- Donald C. Hofer
- Grant Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Ultrafast high resolution contact lithography using excimer lasers
- K. Jain
- B.J. Lin
- 1989
- Proceedings of SPIE 1989
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces
- Ji Yeon Kim
- Philip Liu
- et al.
- 2020
- ACS AMI
Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- Michael J. Maher
- Christopher M. Bates
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Progress in 193 nm positive resists
- R.D. Allen
- R. Soortyakumaran
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.