Chemically amplified resists based on polymer side‐chain rearrangement or electrophilic crosslinking
- J.M.J. Fréchet
- S. Matuszczak
- et al.
- 2004
- Polymer Engineering & Science
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104 results for C. Grant Willson
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Chemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science
Soluble polysilanes: An interesting new class of radiation sensitive materials
- R.D. Miller
- D. Hofer
- et al.
- 2004
- Polymer Engineering & Science
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
Formation of deprotected fuzzy blobs in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- Journal of Polymer Science, Part B: Polymer Physics
Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists
- Peter I. Tattersall
- David Breslin
- et al.
- 2004
- Chemistry of Materials
Polymeric liquid crystals: structural basis for ferroelectric and nonlinear optical properties
- R. Zentel
- H. Poths
- et al.
- 2003
- Polymers for Advanced Technologies
Synthesis and Polymerization of Alkyl -(Alkylsulfonyl)acrylates
- E. Gipstein
- C.G. Willson
- et al.
- 2002
- Journal of Organic Chemistry