Systematic studies on reactive ion etch-induced deformations of organic underlayers
- Martin Glodde
- Sebastian Engelmann
- et al.
- 2011
- SPIE Advanced Lithography 2011
Publications
Date
Featured collections
Popular topics
28 results for Pushkara Rao Varanasi
Fluorine-free photoacid generators for 193 nm lithography based on non-sulfonate organic superacids
- Martin Glodde
- Sen Liu
- et al.
- 2010
- J. Photopolym. Sci. Tech.
A new breed of wet-developable BARC materials
- Libor Vyklicky
- Wu-Song Huang
- et al.
- 2009
- J. Photopolym. Sci. Tech.
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Building an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005