Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2019
- JES
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12 results for Edward Gipstein
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
The synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2003
- Journal of Applied Polymer Science
Pyrolysis–molecular weight chromatography–vapor‐phase infrared spectrophotometry: An on‐line system for analysis of polymers. III. Thermal decomposition of polysulfones and polystyrene
- Erdoǧan Kiran
- John K. Gillham
- et al.
- 2003
- Journal of Applied Polymer Science
Determination of the structural configuration of cresol–novolak resins by 13C NMR spectroscopy
- J.A. Carothers
- E. Gipstein
- et al.
- 2003
- Journal of Applied Polymer Science
Polymerization and Copolymerization of N-Vinylindole and N-Vinylmethylindoles
- Edward Gipstein
- William A. Hewett
- 2002
- Macromolecules
Synthesis and Characterization of Dibenzothiophene-Formaldehyde Copolymers
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2002
- Macromolecules
Synthesis and Polymerization of Alkyl -(Alkylsulfonyl)acrylates
- E. Gipstein
- C.G. Willson
- et al.
- 2002
- Journal of Organic Chemistry
In situ preparation of lithographic resists containing glutarimide groups
- Hiroyuki Hiraoka
- Edward Gipstein
- et al.
- 1978
- Journal of Applied Polymer Science
Morphological studies of poly(olefin sulfones) by light scattering
- W.H. Chu
- E. Gipstein
- et al.
- 1977
- Journal of Applied Polymer Science