Diazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering
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46 results for Jane M. Shaw
A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
Polysiloxanes for deep UV lithography
- J.M. Shaw
- M. Hatzakis
- et al.
- 1985
- Microelectronic Engineering
SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.
- J. Paraszczak
- E. Babich
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Performance characteristics of diazo-type photoresists under e-beam and optical exposure
- Jane M. Shaw
- Michael Hatzakis
- 1978
- IEEE T-ED
Characterization of Positive Photoresist
- Frederick H. Dill
- William P. Hornberger
- et al.
- 1975
- IEEE T-ED