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Compact modeling of FinFETs featuring independent-gate operation modeC.-H. LinX. Xiet al.2005VLSI Technology 2005
A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO 2)S. ZafarM. Yanget al.2005VLSI Technology 2005
Switching delay variability in NMOS and PMOS PDSOI passgate circuitsMark KetchenManjul Bhushanet al.2005VLSI Technology 2005
A 0.168μm 2/0.11μm 2 highly scalable high performance embedded DRAM cell for 90/65-nm logic applicationsG. WangP. Parrieset al.2005VLSI Technology 2005