ALD-based confined PCM with a metallic liner toward unlimited enduranceWanki KimMatthew BrightSkyet al.2016IEDM 2016
CMOS compatible MIM decoupling capacitor with reliable sub-nm EOT high-k stacks for the 7 nm node and beyondTakashi AndoEduard Cartieret al.2016IEDM 2016
High-Q magnetic inductors for high efficiency on-chip power conversionNaigang WangBruce Doriset al.2016IEDM 2016
Hot carrier effect in ultra-scaled replacement metal gate Sii-xGex channel p-FinFETsMiaomiao WangX. Miaoet al.2016IEDM 2016