Engineering the electronic defect bands at the Si1-xGex/IL interface: Approaching the intrinsic carrier transport in compressively-strained Si1-xGex pFETsChoonghyun LeeRichard G. Southwicket al.2016IEDM 2016
Monolithic integration of multiple III-V semiconductors on Si for MOSFETs and TFETsHeinz SchmidD. Cutaiaet al.2016IEDM 2016
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channelsRuilong XiePietro Montaniniet al.2016IEDM 2016
Comprehensive model for progressive breakdown in nFETs and pFETsS. LombardoErnest Y. Wuet al.2016IEDM 2016