An OCD perspective of line edge and line width roughness metrology
- Ravi Bonam
- R. Muthinti
- et al.
- 2017
- SPIE Advanced Lithography 2017
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23 results at SPIE Advanced Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- Luciana Meli
- Karen Petrillo
- et al.
- 2017
- SPIE Advanced Lithography 2017
Investigation of alternate mask absorbers in EUV lithography
- Martin Burkhardt
- 2017
- SPIE Advanced Lithography 2017
Silicon photonics and challenges for fabrication
- N. Feilchenfeld
- Karen Nummy
- et al.
- 2017
- SPIE Advanced Lithography 2017
Fundamentals of EUV resist-inorganic hardmask interactions
- Dario Goldfarb
- Martin Glodde
- et al.
- 2017
- SPIE Advanced Lithography 2017
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- Indira Seshadri
- Anuja De Silva
- et al.
- 2017
- SPIE Advanced Lithography 2017
Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond
- Derren Dunn
- John R. Sporre
- et al.
- 2017
- SPIE Advanced Lithography 2017
Mix-and-match considerations for EUV insertion in N7 HVM
- Xuemei Chen
- Allen Gabor
- et al.
- 2017
- SPIE Advanced Lithography 2017
Single-expose patterning development for EUV lithography
- Anuja De Silva
- Karen Petrillo
- et al.
- 2017
- SPIE Advanced Lithography 2017
Reaching for the true overlay in advanced nodes
- Chiew-Seng Koay
- Bassem Hamieh
- et al.
- 2017
- SPIE Advanced Lithography 2017