Publications

221 results at Microelectronic Engineering

Highly selective KOH-based etchant for boron-doped silicon structures
- - E. Bassous
  - A.C. Lamberti
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- - A.N. Broers
  - A.E. Timbs
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- - R. Viswanathan
  - R.E. Acosta
  - et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
Chemically assisted ion beam etching process for high quality laser mirrors
- - P. Buchmann
  - H.P. Dietrich
  - et al.
- 1989
- Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- - P. Coane
  - P. Rudeck
  - et al.
- 1989
- Microelectronic Engineering
Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- - Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- - J. Paraszczak
  - E. Babich
  - et al.
- 1987
- Microelectronic Engineering
Photoemission sampling technique for high-speed integrated-circuit testing
- - H. Beha
  - H.K. Seitz
  - et al.
- 1987
- Microelectronic Engineering
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- - S.S. Dana
  - J. Batey
  - et al.
- 1987
- Microelectronic Engineering