Thermally robust dual-work function ALD-MN x MOSFETs using conventional CMOS process flowD.-G. ParkZ. Luoet al.2004VLSI Technology 2004
Systematic study of pFET Vt with Hf-based gate stacks with poly-Si and FUSI gatesE. CartierV. Narayananet al.2004VLSI Technology 2004
A model for negative bias temperature instability (NBTI) in oxide and high κ pFETsSufi ZafarByoung H. Leeet al.2004VLSI Technology 2004
A 243-GHz Ft and 208-GHz Fmax, 90-nm SOI CMOS SoC technology with low-power millimeter-wave digital and RF circuit capabilityNoah ZamdmerJonghae Kimet al.2004VLSI Technology 2004
Dual work function metal gate CMOS using CVD metal electrodesV. NarayananA.C. Callegariet al.2004VLSI Technology 2004
Dual workfunction fully silicided metal gatesC. Cabral Jr.J. Kedzierskiet al.2004VLSI Technology 2004
A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOSB. DorisY. Zhanget al.2004VLSI Technology 2004
Channel design and mobility enhancement in strained germanium buried channel MOSFETsH. ShangJ.O. Chuet al.2004VLSI Technology 2004
On the integration of CMOS with hybrid crystal orientationsM. YangV. Chanet al.2004VLSI Technology 2004