Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
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19 results at SPIE Advanced Lithography 2008
Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law
- Hiroshi Ito
- 2008
- SPIE Advanced Lithography 2008
Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Graded spin-on organic bottom antireflective coating for high NA lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
- Frances A. Houle
- Ann Fornof
- et al.
- 2008
- SPIE Advanced Lithography 2008
Integration of polymer self-assembly for lithographic application
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008