Patterning method impact on sub-36nm pitch interconnect variability
- N.V. Licausi
- James C.-H. Chen
- et al.
- 2018
- SPIE Advanced Lithography 2018
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11 results at SPIE Advanced Lithography 2018
Exploration of resist effect in source mask optimization
- Ao Chen
- Yee Mei Foong
- et al.
- 2018
- SPIE Advanced Lithography 2018
Line edge roughness reduction for 7nm metals
- Zheng Chen
- Steve McDermott
- et al.
- 2018
- SPIE Advanced Lithography 2018
Polymer brush as adhesion promoter for EUV patterning
- Jing Guo
- Anuja De Silva
- et al.
- 2018
- SPIE Advanced Lithography 2018
Inorganic hardmask development for EUV patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2018
- SPIE Advanced Lithography 2018
Introduction of pre-etch deposition techniques in EUV patterning
- Xun Xiang
- Genevieve Beique
- et al.
- 2018
- SPIE Advanced Lithography 2018
Aqueous developers for positive tone ultrathin chemically amplified EUV resists
- Dario Goldfarb
- Bharat Kumar
- 2018
- SPIE Advanced Lithography 2018
Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning
- Angelique Raley
- Joe Lee
- et al.
- 2018
- SPIE Advanced Lithography 2018
Characterization and control of EUV scanner dose uniformity and stability
- Chris Robinson
- Daniel Corliss
- et al.
- 2018
- SPIE Advanced Lithography 2018
Defect detection strategies and process partitioning for SE EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2018
- SPIE Advanced Lithography 2018