Polymer dynamics and diffusive properties in ultra-thin photoresist films
- Christopher L. Soles
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
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15 results at Microlithography 2003
Does line edge roughness matter?: FEOL and BEOL perspectives
- Qinghuang Lin
- Chuck Black
- et al.
- 2003
- Microlithography 2003
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Using the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Deprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Diffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
The estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003