Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- K. Chiong
- F.J. Hohn
- 1990
- Microlithography 1990
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11 results at Microlithography 1990
Stepper self-metrology using automated techniques
- T.A. Brunner
- J.M. Lewis
- et al.
- 1990
- Microlithography 1990
Quantitative measures for surface texture description in semiconductor wafer inspection
- A.Ravishankar Rao
- Ramesh Jain
- 1990
- Microlithography 1990
ALF: A facility for x-ray lithography
- L. Grant Lesoine
- Kenneth W. Kukkonen
- et al.
- 1990
- Microlithography 1990
Model for focused ion beam deposition
- J.P. Levin
- P.G. Blauner
- et al.
- 1990
- Microlithography 1990
Electron beam lithography, directions in direct write and mask making
- F.J. Hohn
- 1990
- Microlithography 1990
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990