Publications

24 results at SPIE Advanced Lithography 2015

Topology and context-based pattern extraction using line-segment Voronoi diagram
- - Sandeep Kumar Dey
  - Panagiotis Cheilaris
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- - Ştefan Apostol
  - Paul Hurley
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Inverse lithography using sparse mask representations
- - Radu C. Ionescu
  - Paul Hurley
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Experiments using automated sample plan selection for OPC modeling
- - Ramya Viswanathan
  - Om Jaiswal
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Forbidden pitches: Causes, source optimization, and their role in design rules
- - Ştefan Apostol
  - Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Induced e-beam charge impact on spatial orientation of gate-All-Around silicon wires device fabricated on boron nitride substrate
- - Shimon Levi
  - Konstantin Chirko
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Machine learning and predictive data analytics enabling metrology and process control in IC fabrication
- - Narender Rana
  - Yunlin Zhang
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Etch patterning for advanced devices
- - Effendi Leobandung
- 2015
- SPIE Advanced Lithography 2015
Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography
- - Nobuhiro Okai
  - Erin Lavigne
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- - Karen Petrillo
  - Nicole Saulnier
  - et al.
- 2015
- SPIE Advanced Lithography 2015