Patterning of CMOS device structures for 40-80nm pitches and beyond
- Sebastian U. Engelmann
- R.M. Martin
- et al.
- 2012
- SPIE Advanced Lithography 2012
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15 results at SPIE Advanced Lithography 2012
Advanced plasma etch technologies for nanopatterning
- Rich Wise
- 2012
- SPIE Advanced Lithography 2012
The effects of plasma exposure on low-k dielectric materials
- J.L. Shohet
- H. Ren
- et al.
- 2012
- SPIE Advanced Lithography 2012
Pattern collapse mitigation strategies for EUV Lithography
- Dario L. Goldfarb
- Robert L. Bruce
- et al.
- 2012
- SPIE Advanced Lithography 2012
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Computing exact Fourier series coefficients of IC rectilinear polygons from low-resolution fast Fourier coefficients
- Robin Scheibler
- Paul Hurley
- 2012
- SPIE Advanced Lithography 2012
Process optimization through model based SRAF printing prediction
- Ramya Viswanathan
- Jaione Tirapu Azpiroz
- et al.
- 2012
- SPIE Advanced Lithography 2012
Fast source independent estimation of lithographic difficulty supporting large scale source optimization
- David Demaris
- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
Lens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
- Scott Halle
- Michael Crouse
- et al.
- 2012
- SPIE Advanced Lithography 2012
Dose-focus monitor technique using CD-SEM and application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- SPIE Advanced Lithography 2012