Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
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28 results at J. Micro/Nanolithogr. MEMS MOEMS
Deep learning-based detection, classification, and localization of defects in semiconductor processes
- Dhruv V. Patel
- Ravi Bonam
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Overlay error statistics for multiple-exposure patterning
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Inorganic hardmask development for extreme ultraviolet patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning
- Angelique Raley
- Joe Lee
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Multiple stages of regression to improve accuracy in calibrated lithography process models
- Pardeep Kumar
- Alan E. Rosenbluth
- et al.
- 2018
- J. Micro/Nanolithogr. MEMS MOEMS
Modeling fluid transport in two-dimensional paper networks
- Jaione Tirapu-Azpiroz
- Ademir Ferreira Silva
- et al.
- 2018
- J. Micro/Nanolithogr. MEMS MOEMS
Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- Indira Seshadri
- Anuja De Silva
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS