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12 results at Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Contamination mitigation of hydrogen silsesquioxane resist processed with Na⁺-containing developer for nanoscale CMOS device patterning
- - Markus Brink
  - Isaac Lauer
  - et al.
- 2014
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Impact of low-k structure and porosity on etch processes
- - Maxime Darnon
  - Nicolas Casiez
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- - Hsin-Yu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- - Ramakrishnan Ayothi
  - Lovejeet Singh
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Mitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
- - Alfred Wagner
  - Martin Burkhardt
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Fabrication of an electrical spin transport device utilizing a diazonium salt/hafnium oxide interface layer on epitaxial graphene grown on 6 H-SiC(0001)
- - Joseph Abel
  - Akitomo Matsubayashi
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- - R. Bruce
  - Florian Weilnboeck
  - et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Epitaxial growth of Dy₂ O₃ films on SrTiO₃ (001) substrates by molecular beam epitaxy
- - Md. Nurul Kabir Bhuiyan
  - Mariela Menghini
  - et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Domain dynamics in epitaxial Pb (Zr_0.2Ti_0.8)O ₃ films studied by piezoelectric force microscopy
- - Levente J. Klein
  - Catherine Dubourdieu
  - et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- - R. Bruce
  - T. Lin
  - et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics