Conference paper
Electromigration and diffusion in pure Cu and Cu(Sn) alloys
C.-K. Hu, K.L. Lee, et al.
MRS Spring Meeting 1996
rf sputter etching has been successful tested for microsectioning and profiling of Au195 radioactive tracer self-diffusion into Au. It was possible to obtain sections of only 50 Å thickness in a reproducible manner and measure extremely small diffusion coefficients. The technique is expected to lend itself universally for diffusion microsectioning. © 1970 The American Institute of Physics.
C.-K. Hu, K.L. Lee, et al.
MRS Spring Meeting 1996
D. Gupta, C.-K. Hu, et al.
Defect and Diffusion Forum
D. Gupta, K. Vieregge, et al.
Acta Materialia
J.L. Liotard, D. Gupta, et al.
Journal of Applied Physics