Conference paper
Sensitive polysilane resists for bilayer lithography
G.M. Wallraff, R.D. Miller, et al.
ACS Spring 1991
No abstract available.
G.M. Wallraff, R.D. Miller, et al.
ACS Spring 1991
R.D. Miller, W. Theis, et al.
Journal of Organic Chemistry
T.J. Lenk, V.M. Hallmark, et al.
Macromolecules
N.E. Schlotter, J.F. Rabolt
Polymer