Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999
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54 results for Donald C. Hofer
Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
An anomalously long-wavelength electronic transition in conformationally locked organosilane high polymers
- R.D. Miller
- D. Hofer
- et al.
- 2002
- JACS
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
- D. Fenzel-Alexander
- et al.
- 2000
- Microlithography 2000
Molecular weight tailoring in methacrylate 193 nm photoresists
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998