Huai-Yu Cheng, Simone Raoux, et al.
Journal of Applied Physics
We present the results of a primary study on an OTS chalcogenide material system (TeAsGeSi) that incorporates Se and an extra dopant. Vth and IOFF are trade-off parameters that can be tuned by modification of OTS composition, thickness and process temperature. The resulting new selector material demonstrated excellent endurance (>1010 with 50ns-pulsed 400uA On-current) and robust OTS characteristics after 350oC/30 mins annealing. The thin film could withstand 500 oC annealing.
Huai-Yu Cheng, Simone Raoux, et al.
Journal of Applied Physics
Nanbo Gong, W. Chien, et al.
VLSI Technology 2020
Sangbum Kim, Pei-Ying Du, et al.
VLSI-TSA 2012
Zhi-Lun Liu, Alexander Grun, et al.
Scientific Reports