M. Yang, J. Schaub, et al.
VLSI Technology 2003
The irreversible isothermal annealing of the as-deposited defects of hydrogenated amorphous silicon, a-Si, deposited at room temperature by concentric-electrode radio-frequency glow discharge is studied using dark and photoconductivity, space-charge limited current, and time-of-flight. The photoconductivity increases as a power law of the annealing time with exponent 0.8. The density of states at the Fermi level, measured by space-charge limited current, is inversely proportional to the annealing time. These results are compatible with bimolecular annealing kinetics. The dark conductivity obeys a Meyer-Nelder rule during the isothermal anneal.