Hiroshi Ito, Reinhold Schwalm
JES
Conference paper
Developing chemical amplification resists for semiconductor device fabrication by microlithography
Related
Conference paper
Lactones in 193 nm resists: What do they do?
Hiroshi Ito, Hoa D. Truong, et al.
SPIE Advanced Lithography 2008
Bokyung Yoon, June Huh, et al.
Advanced Materials
Robert D. Allen, Carl E. Larson, et al.
J. Photopolym. Sci. Tech.