Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Molecular glass resists have gained attention for the past decade as a potential platform for high resolution lithography. Several molecular resist materials based on the calix[4]resorcinarene system have been developed. Though this molecular system is very versatile, there are several challenges with the synthesis and processing of these materials. The difficulty to synthesize a monodipserse unit, the poor solubility in casting solvents and incompatibility with conventional developer are some noted challenges. We have addressed these issues by designing a new calix[4]resorcinarene resist material with hexafluro alcohol (HFA) units. The resist platform has been evaluated with e-beam and EUV lithography. © 2011 SPIE.
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985