Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
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76 results for R. Sooriyakumaran
Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999
Acid-catalyzed dehydration for the design of chemical amplification resists
- Hiroshi Ito
- R. Sooriyakumaran
- et al.
- 1991
- ACS Spring 1991
Variable-Temperature 13C and 29Si CPMAS NMR Studies of Poly(di-n-hexylsilane)
- Gian C. Gobbi
- William W. Fleming
- et al.
- 2002
- JACS
Poly(di-n-pentylsilane): The Spectral Consequences of a Helical Conformation in the Solid State
- R.D. Miller
- B.L. Farmer
- et al.
- 2002
- JACS
Mechanism of the Photochemical Degradation of Poly(di-n-alkylsilanes) in Solution
- Takashi Karatsu
- Josef Michl
- et al.
- 2002
- JACS
Defects on high resolution negative-tone resist The revenge of the blobs
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- SPIE Photomask Technology + EUV Lithography 2012
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Investigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012