Defects on high resolution negative-tone resist The revenge of the blobs
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
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76 results for R. Sooriyakumaran
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- SPIE Photomask Technology + EUV Lithography 2012
Investigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Enhancing water permeability of fouling-resistant POSS-PEGM hydrogels using 'addition-extraction' of sacrificial additives
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2012
- Journal of Membrane Science
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Bifunctional hydrogel coatings for water purification membranes: Improved fouling resistance and antimicrobial activity
- Young-Hye La
- Bryan D. McCloskey
- et al.
- 2011
- Journal of Membrane Science
Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
Thin film composite polyamide membrane containing hexafluoroalcohol (HFA) functionality for water desalination
- Young-Hye Na
- Ratnam Sooriyakumaran
- et al.
- 2010
- NAMS-ICIM 2010