Novel methods for the fabrication of well-defined and patterned polymer brushes
- Didier Benoit
- Marc Husemann
- et al.
- 1999
- ACS Spring 1999
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120 results for William D. Hinsberg
Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
Toughened, inorganic-organic hybrid materials for microelectronic application
- J.L. Hedrick
- S.A. Srinivasan
- et al.
- 1996
- MRS Fall Meeting 1996
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2010
- ACS Nano
Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers
- Joy K. Cheng
- Charles T. Rettner
- et al.
- 2008
- Advanced Materials
Manipulation of surface properties by patterning of covalently bound polymer brushes [22]
- Marc Husemann
- Michael Morrison
- et al.
- 2000
- JACS
Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists
- Glenn Mcgall
- Jeff Labadie
- et al.
- 1996
- PNAS