Annina Riedhauser, Viacheslav Snigirev, et al.
CLEO 2023
We demonstrate scaled InGaAs-on-insulator FinFETs and planar MOSFETs on Si substrate for low power logic and RF applications. This Si-CMOS compatible technology implements SiNx source-drain spacers and doped extensions for reduced overlap capacitances. FinFETs with performance for logic applications matching state-of-the-art are demonstrated. Simultaneously, ft and fmax of 400 and 100 GHz are achieved respectively, the highest reported ft for a III-V MOSFET on Si. Finally, we explore the use of an extended gate line to reduce gate resistance, offering balanced ft/fmax of 215/300 GHz, the first report of III-V RF devices on Si matching state of the art Si-CMOS.
Annina Riedhauser, Viacheslav Snigirev, et al.
CLEO 2023
Clarissa Convertino, C. B. Zota, et al.
Japanese Journal of Applied Physics
Clarissa Convertino, C. B. Zota, et al.
Journal of Physics Condensed Matter
V. Djara, Marilyne Sousa, et al.
Microelectronic Engineering