R.W. Gammon, E. Courtens, et al.
Physical Review B
For the first time we present compelling theoretical and experimental evidence that the inversion channel mobility in HfO 2/SiO(N)/Si is significantly reduced by soft-phonon scattering. This scattering mechanism - associated with the high-κ material itself- poses an intrinsic limit to the mobility that can not be countered by process optimization.
R.W. Gammon, E. Courtens, et al.
Physical Review B
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
E. Wu, J. Suñé, et al.
IEDM 2003