Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks
- M. Gribelyuk
- C. Cabral Jr.
- et al.
- 2007
- Thin Solid Films
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76 results for E. Gusev
Measurements of metal gate effective work function by x-ray photoelectron spectroscopy
- Yuri Lebedinskii
- Andrei Zenkevich
- et al.
- 2007
- Journal of Applied Physics
Tunable Workfunction for Fully Silicied Gates (FUSI) and Proposed Mechanisms
- Y.-H. Kim
- C. Cabral Jr.
- et al.
- 2006
- VLSI-TSA 2006
Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
- Evgeni P. Gusev
- Vijay Narayanan
- et al.
- 2006
- IBM J. Res. Dev
Thermal ammonia nitridation on HfO2 and hafnium silicates thin films
- J.-J. Ganem
- I. Trimaille
- et al.
- 2006
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
The role of Si orientation and temperature on the carrier mobility in metal oxide semiconductor field-effect transistors with ultrathin HfO 2 gate dielectrics
- B. Mereu
- C. Rossel
- et al.
- 2006
- Journal of Applied Physics
Process optimization for high electron mobility in nMOSFETs with aggressively scaled HfO2/metal stacks
- V. Narayanan
- K. Maitra
- et al.
- 2006
- IEEE Electron Device Letters
Room temperature interactions of water vapor with HfO 2 films on Si
- C. Driemeier
- E. Gusev
- et al.
- 2006
- Applied Physics Letters
Hybrid-orientation technology (HOT): Opportunities and challenges
- Min Yang
- Victor W.C. Chan
- et al.
- 2006
- IEEE Transactions on Electron Devices
Characterization of HfO2/Si exposed to water vapor at room temperature
- Carlos Driemeier
- Elizandra Martinazzi
- et al.
- 2006
- MRS Spring Meeting 2006