Conference paper
CONFORMATIONALLY LOCKED ORGANOSILANE HIGH POLYMERS.
R.D. Miller, D. Hofer, et al.
ACS National Meeting 1984
We report on the excimer laser-induced photoablation of some organosilane polymers utilizing quartz microbalance techniques to monitor the nature of the ablation phenomenon. A fluence threshold for the ablation process is identified beyond which the material removal rate depends nonlinearly on the adsorbed laser fluence. Below this threshold, photo-oxidation of the polymer is observed as evidenced by mass uptake of the film. Our results suggest that photoablation of the polysilanes studied is a result of a combination of thermal and photochemical processes.
R.D. Miller, D. Hofer, et al.
ACS National Meeting 1984
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