Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
J. Tersoff
Applied Surface Science
Imran Nasim, Melanie Weber
SCML 2024